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Tailoring absorption spectrum by inserting an epsilon-near-zero film into metal-dielectric-metal assembly

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Abstract A method of tailoring the absorption band generated by metal-dielectric-metal (MDM) resonator is analytically proposed and numerically investigated in this paper. By inserting an epsilon-near-zero (ENZ) film into the… Click to show full abstract

Abstract A method of tailoring the absorption band generated by metal-dielectric-metal (MDM) resonator is analytically proposed and numerically investigated in this paper. By inserting an epsilon-near-zero (ENZ) film into the MDM layers, the absorption bandwidth can be sufficiently widened due to the coupling from ENZ mode to localized edge plasmon mode. Theoretical instructions of how to design respective layer thickness to obtain optimized absorption rate are investigated with the guidance of vast simulations and the hybrid resonance characteristics by the coupling from ENZ mode are further inspected by monitoring the resonant electric and magnetic field. The meta-absorber can achieve high absorption with a large bandwidth under oblique incidence. The method and the structure proposed in this paper have potential views in highly integrated nanostructures in solar cells, photovoltaic and sensing application fields.

Keywords: metal; metal dielectric; tailoring absorption; absorption; inserting epsilon; dielectric metal

Journal Title: Solid State Communications
Year Published: 2019

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