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Layout dependent hot-carrier-injection-induced pLDMOS degradation from a non-destructive characterization viewpoint

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Abstract Vgmax Hot-Carrier-Injection (HCI) degradation in Multi-finger p-Laterally-Diffused Metal-Oxide-Semiconductor Field-Effect-Transistors (LDMOSFET) had been investigated by Multi-Region Direct-Current-Current-Voltage (MR-DCIV) characterization method-probing the interface state distribution along the channel, accumulation and (Shallow… Click to show full abstract

Abstract Vgmax Hot-Carrier-Injection (HCI) degradation in Multi-finger p-Laterally-Diffused Metal-Oxide-Semiconductor Field-Effect-Transistors (LDMOSFET) had been investigated by Multi-Region Direct-Current-Current-Voltage (MR-DCIV) characterization method-probing the interface state distribution along the channel, accumulation and (Shallow Trench Isolation) STI-drift region. The method feasibility was verified by device simulation and stress experiment. The enhanced interface state generation in the channel and accumulation region was clearly revealed in multi-finger layout device. This layout dependent degradation was associated with self-heating effect and temperature accelerated Vgmax HCI stress.

Keywords: degradation; hot carrier; layout dependent; carrier injection

Journal Title: Solid-state Electronics
Year Published: 2021

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