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Investigation of resistive switching in PVP and ultra-thin HfOx based bilayer hybrid RRAM

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Abstract Hybrid CBRAM devices based on PVP/HfOx bilayer were investigated for their switching performance. A reliable and low voltage bipolar resistive switching operation was observed in these devices with repeatability… Click to show full abstract

Abstract Hybrid CBRAM devices based on PVP/HfOx bilayer were investigated for their switching performance. A reliable and low voltage bipolar resistive switching operation was observed in these devices with repeatability of 300 cycles, Ion/Ioff of 80, set (Vset) and reset (Vreset) voltages of 1.03 V and −0.68 V, retention time of 7200 s, and switching endurance of >2000 cycles in devices with 2.5 wt% PVP concentration. Low device-to-device variation was observed with 10 devices tested showing nearly similar switching parameters. Weibull's distribution of Vset and Vreset voltages have indicated reliable switching performance in devices. The pinholes formation in PVP layer guides the confined growth and dissolution of Ag conductive filament (CF) in the bilayer structure resulting in a stable, reliable and low voltage switching operation. PVP film roughness and pinholes depth have shown downtrend with PVP concentration. During the set process, a CF formed across the electrodes constitutes of Ag atoms, due to pinholes assisted electro-migration of Ag ions. Whereas in the reset process, the diffused Ag+ ions migrate back towards top electrode due to the electrochemical and joule-heating assisted rupture of CF in the PVP/HfOx bilayer structure.

Keywords: hfox; switching pvp; investigation resistive; bilayer; resistive switching; pvp

Journal Title: Solid State Ionics
Year Published: 2018

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