LAUSR

Abstract This paper provides a detailed analysis of the surface diffusion problem during epitaxial step-flow growth using a simple theoretical model for the diffusion equation of adatoms concentration. Within this framework, an analytical expression for the adatom mobility as a function of the deposition rate and the Next-Nearest-Neighbor (NNN) interactions is derived and compared with the effective mobility computed from kinetic Monte Carlo (kMC) simulations. As far as the ‘small’ step velocity or relatively weak deposition rate commonly used for copper growth is concerned, an excellent quantitative agreement with the theoretical prediction is found. The effective adatoms mobility is shown to exhibit an exponential decrease with NNN interactions strength and increases in roughly linear behavior versus deposition rate F. The effective step stiffness and the adatoms mobility are also shown to be closely related to the concentration of kinks.