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Superconductivity in nanocrystalline tungsten thin films growth by sputtering in a nitrogen-argon mixture

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Abstract We report on the structural and superconducting properties of nanocrystalline tungsten thin films growth by sputtering at room temperature with an N2:Ar mixture (N2 from 3% to 50%). The… Click to show full abstract

Abstract We report on the structural and superconducting properties of nanocrystalline tungsten thin films growth by sputtering at room temperature with an N2:Ar mixture (N2 from 3% to 50%). The crystalline phases were identified by comparing as-grown and thermal annealed thin films. For N2/(Ar + N2) mixtures between 3 and 10%, the films display nanocrystalline β-W phase. Coexistence of β-W and W2N phases are observed for gas mixtures with N2 between 20% and 40%. A detailed study of the superconducting properties as function of the thickness was performed for W films growth with 8% N2 mixtures. For this concentration, the nitrogen atoms increase the disorder at the nanoscale reducing the grain size and avoiding the crystallization of α-W. The superconducting critical temperature (Tc = 4.7 K) is thickness independent for films thicker than ~17 nm. Below this thickness, the Tc value decreases systematically being 3.1 K for 4 nm thick films. Our study provides a simple method for the fabrication of nanocrystalline β-W thin films with potential applications in superconducting devices.

Keywords: tungsten thin; thin films; films growth; growth sputtering; nanocrystalline tungsten

Journal Title: Thin Solid Films
Year Published: 2019

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