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Abstract The deposition of good quality crystalline inorganic coatings by atmospheric pressure dielectric barrier discharge remains a challenge. Thanks to an original coupling of a substrate heating device based on… Click to show full abstract
Abstract The deposition of good quality crystalline inorganic coatings by atmospheric pressure dielectric barrier discharge remains a challenge. Thanks to an original coupling of a substrate heating device based on an inductive current loop and located under the dielectric and an atmospheric pressure dielectric barrier discharge, we show that one can deposit in one step crystalline vanadium oxide and titanium oxide, with grain sizes bigger than those achieved by post-deposition annealing.
Keywords:
inorganic coatings;
crystalline inorganic;
crystalline;
deposition;
improving atmospheric;
atmospheric plasma
Journal Title: Thin Solid Films
Year Published: 2019
Link to full text (if available)
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Journal Title: Thin Solid Films
Year Published: 2019
Link to full text (if available)
Share on Social Media: Sign Up to like & get
recommendations!