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Multifunctional MoOx and MoOxNy films with 2.5 < x < 3.0 and y < 0.2 prepared using controlled reactive deep oscillation magnetron sputtering

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Abstract Reactive deep oscillation magnetron sputtering with a pulsed reactive gas flow control and to-substrate reactive gas injection into the high-density plasma in front of the sputtered Mo target was… Click to show full abstract

Abstract Reactive deep oscillation magnetron sputtering with a pulsed reactive gas flow control and to-substrate reactive gas injection into the high-density plasma in front of the sputtered Mo target was used for a low-temperature (

Keywords: magnetron sputtering; reactive deep; deep oscillation; oscillation magnetron

Journal Title: Thin Solid Films
Year Published: 2021

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