Abstract Reactive deep oscillation magnetron sputtering with a pulsed reactive gas flow control and to-substrate reactive gas injection into the high-density plasma in front of the sputtered Mo target was… Click to show full abstract
Abstract Reactive deep oscillation magnetron sputtering with a pulsed reactive gas flow control and to-substrate reactive gas injection into the high-density plasma in front of the sputtered Mo target was used for a low-temperature (
               
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