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2 MeV Argon (Ar+) ion induced nano-fabrication in GaSb epi-layers on GaAs substrates

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Abstract 2 MeV Argon (Ar+) ion irradiation in the fluence range of 1 × 1016 to 5 × 1016 ions/cm2 at normal incidence results in formation of a mesoporous layer with… Click to show full abstract

Abstract 2 MeV Argon (Ar+) ion irradiation in the fluence range of 1 × 1016 to 5 × 1016 ions/cm2 at normal incidence results in formation of a mesoporous layer with interconnected nanofiber structures underneath a thin continuous layer in molecular beam epitaxy (MBE) grown GaSb layers on GaAs substrates. Ion irradiation in the fluence range of 1 × 1012 to 1 × 1015 ions/cm2 resulted in no change in the layer morphology. The structural modification in the epi-layers follows the trend observed in Ar+-ion irradiated GaSb epi-layers at keV range energies reported earlier by us and is explained using a simulation of ion-matter interaction at different energies. Raman spectroscopy and high resolution X-ray diffraction (HRXRD) results from the 2 MeV ion irradiated samples suggest preservation of crystallinity in the irradiated layers till the ion fluence of 1 × 1015 ions/cm2 and an increasing residual stress with increasing ion fluence.

Keywords: mev argon; layers gaas; ion; argon ion; epi layers

Journal Title: Vacuum
Year Published: 2020

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