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Simulation of the effect of argon pressure on thermal processes in the sputtering unit of a magnetron with a hot target

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Abstract In this work, thermal processes occurring in the sputtering unit of a DC magnetron with a hot titanium target are studied. The processes are described within the framework of… Click to show full abstract

Abstract In this work, thermal processes occurring in the sputtering unit of a DC magnetron with a hot titanium target are studied. The processes are described within the framework of a stationary heat problem with a surface source using a three-dimensional homogeneous Fourier equation. The problem was solved numerically using the Heat Transfer Module of the COMSOL Multiphysics software. The novelty of the work is the creation of a 3D model of a vacuum chamber with a sputtering unit attached to it. In this case, in the boundary conditions, the heat removal from the target of the sputtering unit is specified, not only in the form of radiation and by the elements of the target attachment, but also due to the thermal conductivity of the gas. The effective temperature of the target surface is revealed to be dependent on the discharge current and pressure exponentially. The simulation results conform with the experimental data.

Keywords: sputtering unit; thermal processes; magnetron hot; unit; target; unit magnetron

Journal Title: Vacuum
Year Published: 2021

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