LAUSR

Abstract The continuous effort for transitioning pulsed laser deposition (PLD) technique from an experimental tool into an industrial one can be sustained by the use of complex tools for in situ real-time monitoring of the deposition process. Langmuir Probe (LP) and optical emission spectroscopy (OES) measurements were used for plasma monitoring during PLD of silver films under various Ar pressure conditions. The LP measurements revealed a multi-structured distribution of the ions, which was strongly influenced by the increase of Ar pressure. The generation of highly energetic ions with the addition of Ar and the degree of Ar gas ionization was confirmed by OES measurements. A perturbative effect was seen under pressures higher than 10 Pa, where the presence of high electronic charges leads to an unstable behavior of plasma in the vicinity of the LP. The effect of these complex dynamics on the structure and quality of the deposited thin film was investigated revealing a strong correlation between the electronic distribution in plasma and thin film thickness profile.