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Change of disinfection byproducts formation potential of natural organic matter after exposure to persulphate and bicarbonate.

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Activated persulphate (PS) oxidation is a promising in situ remediation technology for groundwater and soils. Application of this technology to contaminated zones may result in a large quantity of PS… Click to show full abstract

Activated persulphate (PS) oxidation is a promising in situ remediation technology for groundwater and soils. Application of this technology to contaminated zones may result in a large quantity of PS residue in the subsurface environment due to inefficient activation and repeated injection. In this study, we demonstrated that natural organic matter (NOM) molecules could be reconfigured due to exposure to unactivated PS and bicarbonate, resulting in reduced disinfection byproducts formation potential in post chlorination process. Fourier transformed inferred spectrometry (FTIR), size exclusive chromotraghy (SEC), and mass spectrometry (MS) analysis revealed that hydroxylation and carboxylation of NOM occurred, followed by inter-molecular coupling via ether bonds. The change of both the reactivity toward free chlorine and molecular structure of NOM during PS/bicarbonate treatment was well mimicked by 3,5-dihydroxylbenzoic acid, suggesting that phenolic moieties in NOM molecules were the main sites underwent transformation in the PS/bicarbonate system. We propose that peroxymonocarbonate (HCO4-) formed upon the reaction between PS and bicarbonate was the main reactive species responsible for the reconfiguration of NOM. It selectively attacked the phenolic moieties via single-electron abstracting mechanism, leading to phenoxy radical intermediates which couple to each other via C-O-C bonds. The findings of this study shed light on the environmental behaviors and impacts of PS in groundwater environment.

Keywords: formation potential; disinfection byproducts; natural organic; organic matter; byproducts formation; bicarbonate

Journal Title: Water research
Year Published: 2020

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