LAUSR

The next generation of advanced computing devices will require complex nanoscale frameworks that extend into 3D. Focused ion beam induced deposition (FIBID), uses an organometallic precursor gas in a field ion microscope to fabricate nanoscale structures with high-precision, and smaller critical dimensions than current offerings by the focused electron induced deposition (FEBID), or traditional liquid metal source FIBID. [1-4] In this work, we explore the mechanisms behind the competition of material deposition and sputtering during the 3D FIBID process in a Helium Ion Microscope (HIM), via controlled experiments and Monte Carlo simulations. [5] We provide a diagrammatic road-map for synthesis of 3D structures with highly specified geometries, as well as discuss the interplay between key parameters that affect the final product.