LAUSR

The ZEISS ORION NanoFab is a multi-ion beam platform which makes available a combination of helium, neon, and gallium focused ion beams (FIBs). The helium beam is commonly used for imaging, and in this capacity reveals sub-nanometer details with high contrast, surface sensitivity, minimal charging artifacts, and a long depth of focus. The gallium ion beam is used for traditional FIB applications, providing very high sputter rates for bulk material removal such as applications like lamella preparation. The neon beam with its intermediate mass provides an appreciable sputter yield with higher precision and reduced implantation effects. Together, this combination of ion beams have enabled many diverse, cutting-edge nanofabrication tasks such as resist lithography, precision sputtering, beam-assisted chemistry, and dislocation engineering [1].