Cadmium Telluride (CdTe) thin films are important materials for optoelectronic and radiation detection applications. Fabrication of CdTe films has been studied using a variety of substrates via heteroepitaxial growth. As… Click to show full abstract
Cadmium Telluride (CdTe) thin films are important materials for optoelectronic and radiation detection applications. Fabrication of CdTe films has been studied using a variety of substrates via heteroepitaxial growth. As a result of the lattice mismatch strain, the CdTe films usually contain threading and misfit dislocations that limit device performance. Recently, a remote epitaxy technique [1] was demonstrated for homoepitaxial systems by transferring a graphene sheet onto the substrate before deposition of the film. Applied to a heteroepitaxial system, this type of compliant interface would allow for the accommodation of misfit strain due to weakened interfacial bonding. In this current work, a similar compliant interface is created by direct growth [2], without the use of pre-transferred graphene, and instead by the self-assembly of a Tellurium (Te) monolayer at the interface [3]. Utilizing pulsed laser deposition (PLD), high-quality epitaxial CdTe films can be grown on sapphire and then transferred from their substrate to be freestanding leaving the substrate for subsequent growths.
               
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