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Atmospheric Plasma-Enhanced Spatial Chemical Vapor Deposition of SiO2 Using Trivinylmethoxysilane and Oxygen Plasma

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SiO2 constitutes one of the most widely used dielectric materials in the microelectronics, packaging, and optical industries. Therefore, the development of new processes to deposit SiO2 at low temp... Click to show full abstract

SiO2 constitutes one of the most widely used dielectric materials in the microelectronics, packaging, and optical industries. Therefore, the development of new processes to deposit SiO2 at low temp...

Keywords: enhanced spatial; plasma; sio2; spatial chemical; atmospheric plasma; plasma enhanced

Journal Title: Chemistry of Materials
Year Published: 2020

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