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Edge-Selective Growth of MCp2 (M = Fe, Co, and Ni) Precursors on Pt Nanoparticles in Atomic Layer Deposition: A Combined Theoretical and Experimental Study

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Recent experiments about the selective coating of transition-metal oxide on Pt nanoparticles have aroused great interest in molecular catalysis for the promotion of both activity and stability. In this work,… Click to show full abstract

Recent experiments about the selective coating of transition-metal oxide on Pt nanoparticles have aroused great interest in molecular catalysis for the promotion of both activity and stability. In this work, first-principles calculations combined with microkinetic methods are employed to shed light on the edge-selective growth mechanism of 3d-transition metal oxide on Pt nanoparticles in atomic layer deposition (ALD) from the metal cyclopentadienyl precursors (MCp2, M = Fe, Co, and Ni). The MCp2 decomposition on the surface of Pt nanoparticles exhibits robust preferential growth, following the order of edge > (100) > (111), which indicates that edges are naturally selected to be covered and the (111) facets could survive toward the MCp2 precursors. The preferred deposition on the edge site is attributed to a more favorable splitting path for the precursors. On the other hand, competing reactions make the overall reaction rates of MCp2 precursors on edge sites follow the order of NiCp2 > FeCp2 > CoCp2. Mor...

Keywords: selective growth; edge selective; deposition; mcp2 precursors; nanoparticles atomic; growth

Journal Title: Chemistry of Materials
Year Published: 2018

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