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We introduce a photoresist based on methacrylate copolymers bearing photochromic spirothiopyran moieties as side groups that can crosslink via supramolecular interaction between the chromophores. Upon two-photon excitation, the resist is… Click to show full abstract
We introduce a photoresist based on methacrylate copolymers bearing photochromic spirothiopyran moieties as side groups that can crosslink via supramolecular interaction between the chromophores. Upon two-photon excitation, the resist is capable of generating freestanding three-dimensional structures and offers an inhibition channel, which allows for stimulated-emission depletion-inspired laser lithography. Reversible inhibition, linewidth narrowing, and resolution enhancement are demonstrated.
Journal Title: Chemistry of Materials
Year Published: 2019
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