We present the full investigation of the atomic layer deposition (ALD) of a mixed rhenium–aluminum oxide, namely ReAl2O3CH3, a material with tunable resistance, comprising the building unit of cond... Click to show full abstract
We present the full investigation of the atomic layer deposition (ALD) of a mixed rhenium–aluminum oxide, namely ReAl2O3CH3, a material with tunable resistance, comprising the building unit of cond...
               
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