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Synthesis and Characterization of Ether Adducts of Thorium Tetrahydroborate Th(BH4)4 and Chemical Vapor Deposition of Thorium Boride Thin Films.

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Treating ThCl4 with LiBH4 in various ethereal solvents affords the adducts Th(BH4)4(Et2O)2, Th(BH4)4(thf)2, and Th(BH4)4(dme) (thf = tetrahydrofuran and dme = 1,2-dimethoxyethane). The structures of these three compounds have been… Click to show full abstract

Treating ThCl4 with LiBH4 in various ethereal solvents affords the adducts Th(BH4)4(Et2O)2, Th(BH4)4(thf)2, and Th(BH4)4(dme) (thf = tetrahydrofuran and dme = 1,2-dimethoxyethane). The structures of these three compounds have been established by single-crystal X-ray diffraction: if the tetrahydroborate groups are considered as occupying one coordination site, the Et2O and thf complexes adopt trans-octahedral coordination geometries, whereas the dme complex exhibits a cis-octahedral structure. All four BH4- ligands in each compound are tridentate, rendering each thorium center 14-coordinate. The Th···B distances range from 2.64 to 2.67 Å, and the Th-O bond lengths are 2.47-2.52 Å. We propose that crystals of Th(BH4)4(thf)2 are isomorphous with those of U(BH4)4(thf)2, but owing to pseudosymmetry the latter was reported in a unit cell that was too small by a factor of 2. IR spectra and 1H and 11B NMR data are reported as well. All three adducts are volatile, subliming readily at 60 °C and 10-4 Torr, making them potentially useful as precursors for the chemical vapor deposition (CVD) of thin films of thorium boride. Passage of Th(BH4)4(Et2O)2 over glass, Si(100), and aluminum substrates heated to 350 °C yields amorphous films of approximate stoichiometry ThB2; films deposited from Th(BH4)4(thf)2 have stoichiometries closer to ThB2.5 and contain some oxygen. Auger, XPS, XRD, and SEM studies of these films are reported.

Keywords: thf; thorium; chemical vapor; bh4 thf; bh4; vapor deposition

Journal Title: Inorganic chemistry
Year Published: 2023

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