The combination of in-situ synchrotron X-ray diffraction and in-situ stress measurements performed during electrochemical Li-alloying/-dealloying of amorphous Si (a-Si) films, having ∼150 nm thick ... Click to show full abstract
The combination of in-situ synchrotron X-ray diffraction and in-situ stress measurements performed during electrochemical Li-alloying/-dealloying of amorphous Si (a-Si) films, having ∼150 nm thick ...
               
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