The development of novel materials that are compatible with nanostructured architectures is required to meet the demands of next-generation energy storage technologies. Atomic layer deposition (ALD) allows for the precise… Click to show full abstract
The development of novel materials that are compatible with nanostructured architectures is required to meet the demands of next-generation energy storage technologies. Atomic layer deposition (ALD) allows for the precise synthesis of new materials that can conformally coat complex 3D structures. In this work, we demonstrate a thermal ALD process for sodium phosphorus oxynitride (NaPON), a thin-film solid-state electrolyte (SSE) for sodium-ion batteries (SIBs). NaPON is analogous to the commonly used lithium phosphorus oxynitride SSE in lithium-ion batteries. The ALD process produces a conformal film with a stoichiometry of Na4PO3N, corresponding to a sodium polyphosphazene structure. The electrochemical properties of NaPON are characterized to evaluate its potential in SIBs. The NaPON film exhibited a high ionic conductivity of 1.0 10-7 S/cm at 25 °C and up to 2.5 10-6 S/cm at 80°C, with an activation energy of 0.53 eV. In addition, the ionic conductivity is comparable and even higher than the ionic conductivities of ALD fabricated Li+ conductors.1-4 This promising result makes NaPON a viable SSE or passivation layer in solid-state SIBs.
               
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