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Nanoporous Metal–Organic Framework Thin Films Prepared Directly from Gaseous Precursors by Atomic and Molecular Layer Deposition: Implications for Microelectronics

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Atomic/molecular layer deposition (ALD/MLD) allows for the direct gas-phase synthesis of crystalline metal–organic framework (MOF) thin films. Here, we show for the first time using krypton and methanol physisorption measurements… Click to show full abstract

Atomic/molecular layer deposition (ALD/MLD) allows for the direct gas-phase synthesis of crystalline metal–organic framework (MOF) thin films. Here, we show for the first time using krypton and methanol physisorption measurements that ALD/MLD-fabricated copper 1,4-benzenedicarboxylate (Cu-BDC) ultrathin films possess accessible porosity matching that of the corresponding bulk MOF.

Keywords: layer deposition; atomic molecular; organic framework; molecular layer; metal organic; thin films

Journal Title: ACS Applied Nano Materials
Year Published: 2023

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