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An atomic layer deposition (ALD) process is reported for the growth of nanoscale PrAlO3 thin films for two-dimensional electronics and memory device applications using tris(isopropylcyclopentadieny... Click to show full abstract
An atomic layer deposition (ALD) process is reported for the growth of nanoscale PrAlO3 thin films for two-dimensional electronics and memory device applications using tris(isopropylcyclopentadieny...
Keywords:
dimensional electronics;
atomic layer;
two dimensional;
layer deposition;
electronics memory
Journal Title: ACS Applied Nano Materials
Year Published: 2019
Link to full text (if available)
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Journal Title: ACS Applied Nano Materials
Year Published: 2019
Link to full text (if available)
Share on Social Media: Sign Up to like & get
recommendations!