LAUSR

van der Waals (vdW) heterostructures of transition metal dichalcogenides (TMDCs) provide an excellent paradigm for next-generation electronic and optoelectronic applications. However, the reproducible fabrications of vdW heterostructure devices and the boosting of practical applications are severely hindered by their unstable performance, due to the lack of criteria to assess the interlayer coupling in heterostructures. Here we propose a physical model involving ultrafast electron transfer in the heterostructures and provide two criteria, η (the ratio of the transferred electrons to the total excited electrons) and ζ (the relative photoluminescence variation), to evaluate the interlayer coupling by considering the electron transfer in TMDC heterostructures and numerically simulating the corresponding rate equations. We have proved the effectiveness and robustness of two criteria by measuring the pump-probe photoluminescence intensity of monolayer WS2 in the WS2/WSe2 heterostructures. During thermal annealing of WS2/WSe2, ζ varies from negative to positive values and η changes between 0 and 4.5 × 10-3 as the coupling strength enhanced; both of them can well characterize the tuning of interlayer coupling. We also design a scheme to image the interlayer coupling by performing PL imaging at two time delays. Our scheme offers powerful criteria to assess the interlayer coupling in TMDC heterostructures, offering opportunities for the implementation of vdW heterostructures for broadband and high-performance electronic and optoelectronic applications.