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Desilylative Coupling Involving C(sp2)-Si Bond Cleavage on Metal Surfaces.

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Desilylative coupling involving C-Si bond cleavage has emerged as one of the most important synthetic strategies for carbon-carbon/heteroatom bond formation in solution chemistry. However, in on-surface chemistry, C-Si bond cleavage… Click to show full abstract

Desilylative coupling involving C-Si bond cleavage has emerged as one of the most important synthetic strategies for carbon-carbon/heteroatom bond formation in solution chemistry. However, in on-surface chemistry, C-Si bond cleavage remains a synthetic challenge. Here, we report the implementation of C(sp2)-Si bond cleavage and subsequent C-C bond formation on metal surfaces. The combination of scanning tunneling microscopy and density functional theory calculation successfully reveals that the incorporation of the C-Br group on the arylsilanes is critical to the success of this desilylative coupling reaction on metal surfaces. Our study represents a promising approach for the removal of protecting silyl groups in on-surface chemistry.

Keywords: bond cleavage; chemistry; desilylative coupling; metal surfaces; bond

Journal Title: Journal of the American Chemical Society
Year Published: 2022

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