LAUSR

Nano-droplets on a foreign substrate have received increasing attention because of their technological possible applications, for instance to catalyse the growth of nanowires. In some cases the droplets can move as a result of a reaction with the substrate. In this work we show that the substrate orientation, the surface morphology and the shape of the pits etched in the substrate by the droplets affect the droplet motion, so that a single mechanism (droplet-induced substrate dissolution) may lead to several unexpected droplet dynamics. The experiments are carried out by low energy electron microscopy on Au-Si and Au-Ge, which are model systems for studying liquid droplet alloys. Studying in-situ the behaviour of Au droplets on various Si and Ge surfaces, we describe a subtle interplay between the substrate orientation, the surface defects, and the droplet motion. Our observations allow a deep understanding of the interfacial mechanisms at the origin of the alloy formation and the associated droplet motion. These mechanisms are based on events of substrate dissolution/recrystallization. The outcomes of this work highlight the importance of the etching anisotropy on the droplet-substrate behaviours, and are essential in the perspective of positioning liquid alloy droplets used for instance as nanowire catalysts.