LAUSR

Silicon (Si), as a quasi-essential element, has a vital role in alleviating the damaging effects of various environmental stresses on plants. Cadmium (Cd) stress is severe abiotic stress, especially in acidic ecological conditions, and Si can demolish the toxicity induced by Cd as well as acidic pH on plants. Based on these hypotheses, we demonstrated 2-repeated experiments to unfold the effects of Si as silica gel on the root morphology and physiology of wheat seedling under Cd as well as acidic stresses. For this purpose, we used nine treatments with three levels of Si nanoparticles (0, 1, and 3 mmol L −1 ) derived from sodium silicate (Na 2 SiO 3 ) against three concentrations of Cd (0, 50, and 200 µmol L −1 ) in the form of cadmium chloride (CdCl 2 ) with three replications were arranged in a complete randomized design. The pH of the nutrient solution was adjusted at 5. The averages of three random replications showed that the mutual impacts of Si and Cd in acidic pH on wheat roots depend on the concentrations of Si and Cd. The collective or particular influence of low or high levels of Si (1 or 3 mM) and acidic pH (5) improved the development of wheat roots, and the collective influence was more significant than that of a single parallel treatment. The combined effects of low or high concentrations of Cd (50 or 200 µM) and acidic pH significantly reduced root growth and biomass while increased antioxidants, and reactive oxygen species (ROS) contents. The incorporation of Si (1 or 3 mmol L −1 ) in Cd-contaminated acidic nutrient solution promoted the wheat root growth, decreased ROS contents, and further increased the antioxidants in the wheat roots compared with Cd single treatments in acidic pH. The demolishing effects were better with a high level of Si (3 mM) than the low level of Si (1 Mm). In conclusion, we could suggest Si as an effective beneficial nutrient that could participate actively in several morphological and physiological activities of roots in wheat plants grown under Cd and acidic pH stresses.