Osmium nanocrystals can be fabricated by electron (3-50 nm, formed by atom migration), 785-815 nm laser (20-50 nm, in micelle islands), and microwave (ca. 1 nm in arrays, >100 mg… Click to show full abstract
Osmium nanocrystals can be fabricated by electron (3-50 nm, formed by atom migration), 785-815 nm laser (20-50 nm, in micelle islands), and microwave (ca. 1 nm in arrays, >100 mg scale) irradiation of a polymer-encapsulated OsII carborane; microfocus X-ray absorption studies at the Os LIII-edge show differences between the three preparation methods, suggesting that the electron-beam irradiated materials have a significant support interaction and/or surface oxidation, while the laser and microwave samples are more like metallic osmium.
               
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