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Chemical capacitance measurements are used to study the defect chemistry of La0.6Sr0.4FeO3–δ thin films and their polarization (η) and pO2 dependence. Important point defects are oxygen vacancies (), electrons (e′)… Click to show full abstract
Chemical capacitance measurements are used to study the defect chemistry of La0.6Sr0.4FeO3–δ thin films and their polarization (η) and pO2 dependence. Important point defects are oxygen vacancies (), electrons (e′) and holes (h˙).
Keywords:
capacitance measurements;
thin films;
chemical capacitance;
chemistry;
defect chemistry
Journal Title: Physical Chemistry Chemical Physics
Year Published: 2018
Link to full text (if available)
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Journal Title: Physical Chemistry Chemical Physics
Year Published: 2018
Link to full text (if available)
Share on Social Media: Sign Up to like & get
recommendations!