We here report on atomic layer deposition (ALD) of the superconducting complex oxide La2-xSrxCuO4-y and provide details of the structural and electrical properties of such films. This is the first… Click to show full abstract
We here report on atomic layer deposition (ALD) of the superconducting complex oxide La2-xSrxCuO4-y and provide details of the structural and electrical properties of such films. This is the first report on a complex oxide thin film with superconducting properties that has been deposited by atomic layer deposition.
               
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