Photo from wikipedia
There is a critical need to develop a method to pattern semiconducting polymers for device applications on the sub-micrometer scale. Click to show full abstract
There is a critical need to develop a method to pattern semiconducting polymers for device applications on the sub-micrometer scale.
Keywords:
effect processing;
additive disc;
conditions additive;
processing conditions;
patterning p3ht;
disc patterning
Journal Title: Journal of Materials Chemistry C
Year Published: 2019
Link to full text (if available)
Share on Social Media: Sign Up to like & get
recommendations!
Journal Title: Journal of Materials Chemistry C
Year Published: 2019
Link to full text (if available)
Share on Social Media: Sign Up to like & get
recommendations!