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Tuning photoionization mechanisms of molecular hybrid materials for EUV lithography applications

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Aromatic structures in organic shell stabilize photoionization products of metal oxo clusters, a new type of materials for EUV lithography. Click to show full abstract

Aromatic structures in organic shell stabilize photoionization products of metal oxo clusters, a new type of materials for EUV lithography.

Keywords: photoionization mechanisms; tuning photoionization; materials euv; mechanisms molecular; euv lithography

Journal Title: Journal of Materials Chemistry C
Year Published: 2019

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