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A facile post-peeling modification approach is developed to form an ultrasmooth monolayer on elastic dielectrics for constructing high-performance conformal organic thin-film transistors. Click to show full abstract
A facile post-peeling modification approach is developed to form an ultrasmooth monolayer on elastic dielectrics for constructing high-performance conformal organic thin-film transistors.
Keywords:
elastic dielectrics;
post peeling;
peeling modification;
facile post;
high performance;
modification approach
Journal Title: Journal of Materials Chemistry C
Year Published: 2019
Link to full text (if available)
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Journal Title: Journal of Materials Chemistry C
Year Published: 2019
Link to full text (if available)
Share on Social Media: Sign Up to like & get
recommendations!