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Evaluation of lateral diffusion length in InAs/GaSb superlattice detectors grown by MOCVD

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The lateral diffusion length ( L h ) of minority carriers in LWIR InAs/GaSb superlattice detectors grown by metalorganic chemical vapour deposition was evaluated. The deeply-etched PNn device exhibits a… Click to show full abstract

The lateral diffusion length ( L h ) of minority carriers in LWIR InAs/GaSb superlattice detectors grown by metalorganic chemical vapour deposition was evaluated. The deeply-etched PNn device exhibits a diffusion-limited behaviour at 80 K, with a dark current density as low as 9.1 × 10 −6 A/cm 2 at −0.1 V and a 50% cut-off of 10.1 μm. In shallow-etched pixels with a common absorber, both the photo-current and the dark current show a size-dependent behaviour. L h deduced from the two methods are 211 and 251 μm, respectively, which are longer than those in superlattice materials grown by molecular beam epitaxy.

Keywords: superlattice detectors; diffusion; inas gasb; gasb superlattice; diffusion length; lateral diffusion

Journal Title: Electronics Letters
Year Published: 2020

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