The lateral diffusion length ( L h ) of minority carriers in LWIR InAs/GaSb superlattice detectors grown by metalorganic chemical vapour deposition was evaluated. The deeply-etched PNn device exhibits a… Click to show full abstract
The lateral diffusion length ( L h ) of minority carriers in LWIR InAs/GaSb superlattice detectors grown by metalorganic chemical vapour deposition was evaluated. The deeply-etched PNn device exhibits a diffusion-limited behaviour at 80 K, with a dark current density as low as 9.1 × 10 −6 A/cm 2 at −0.1 V and a 50% cut-off of 10.1 μm. In shallow-etched pixels with a common absorber, both the photo-current and the dark current show a size-dependent behaviour. L h deduced from the two methods are 211 and 251 μm, respectively, which are longer than those in superlattice materials grown by molecular beam epitaxy.
               
Click one of the above tabs to view related content.