We demonstrate high-performance ultraviolet photodetectors (UV-PDs) based on lattice-matched (LM) InAlN/AlGaN heterostructure field-effect transistors (HFETs) gated by transparent ITO films. Low dark currents of 6.8 × 10−8 and 6.1 × 10−7 A/mm and high photocurrent… Click to show full abstract
We demonstrate high-performance ultraviolet photodetectors (UV-PDs) based on lattice-matched (LM) InAlN/AlGaN heterostructure field-effect transistors (HFETs) gated by transparent ITO films. Low dark currents of 6.8 × 10−8 and 6.1 × 10−7 A/mm and high photocurrent gains over four and three orders of magnitude were obtained for the LM In0.12Al0.88N/Al0.21Ga0.79N and In0.10Al0.90N/Al0.34Ga0.66N HFETs, respectively. The negative threshold voltage shifts under illumination indicate that most of the photo-generated carriers are transported in the two-dimensional gas (2DEG) region around the InAlN/AlGaN interface. High peak responsivities of 2.2 × 104 and 5.4 × 104 A/W and large UV-to-visible rejection ratios greater than 104 and 103 were achieved for the LM In0.12Al0.88N/Al0.21Ga0.79N and In0.10Al0.90N/Al0.34Ga0.66N HFET-type UV-PDs, respectively. These improved performances with respect to other AlGaN UV-PDs around the same wavelength detection range may possibly be attributed to the greater contribution of t...
               
Click one of the above tabs to view related content.