LAUSR

A considerable in-plane uniaxial magnetic anisotropy (UMA) field (Hu ∼ 300 Oe) could be achieved when the amorphous CoFeB film was deposited on the GaAs(001) wafer by magnetron-sputtering after proper etch-annealed procedure. In order to get deep insights into the mechanism of the UMA, the film was annealed at different temperatures and the evolution of the in-plane magnetic anisotropy was investigated carefully. With increasing the annealing temperature (TA), the UMA could be maintained well when TA reached 250°C, but became very weak at 300°C. However, when TA was elevated to 400°C, another UMA (Hu ∼ 130 Oe) was built accompanied with a fourfold magnetic anisotropy with its strength of about 50 Oe. In terms of the magnetic anisotropy evolution along with TA, the anelastic strain, which is thought to be resulted from the interfacial interaction between CoFeB and GaAs, may play a dominant role in producing the enhanced UMA based on the ‘bond-orientational’ anisotropy (BOA) model.