LAUSR.org creates dashboard-style pages of related content for over 1.5 million academic articles. Sign Up to like articles & get recommendations!

High performance InGaN double channel high electron mobility transistors with strong coupling effect between the channels

In this paper, high performance InGaN double channel (DC) high electron mobility transistors (HEMTs) are proposed and systematically investigated. Due to the coordination of double InGaN channels, a large maximum… Click to show full abstract

In this paper, high performance InGaN double channel (DC) high electron mobility transistors (HEMTs) are proposed and systematically investigated. Due to the coordination of double InGaN channels, a large maximum drain current density and a distinct double-hump feature of the transconductance and frequency performance are achieved. More importantly, it is revealed that the coupling effect between the two InGaN channels is much stronger than that of the conventional GaN DC HEMTs. This characteristic leads to a remarkable enhancement in the gate voltage swing, indicating the excellent linearity of the InGaN DC HEMTs at both dc and rf conditions. Benefiting from the enhanced electron confinement in InGaN channels, the fabricated HEMTs show a low off state drain leakage current of 0.26 μA/mm and a high on/off current ratio (Ion/Ioff) of 5.1 × 106. In addition, the desirable current collapse and breakdown characteristics are also obtained. This work convincingly demonstrates the great potential and practicality of the InGaN DC HEMTs for high power and high bandwidth applications.In this paper, high performance InGaN double channel (DC) high electron mobility transistors (HEMTs) are proposed and systematically investigated. Due to the coordination of double InGaN channels, a large maximum drain current density and a distinct double-hump feature of the transconductance and frequency performance are achieved. More importantly, it is revealed that the coupling effect between the two InGaN channels is much stronger than that of the conventional GaN DC HEMTs. This characteristic leads to a remarkable enhancement in the gate voltage swing, indicating the excellent linearity of the InGaN DC HEMTs at both dc and rf conditions. Benefiting from the enhanced electron confinement in InGaN channels, the fabricated HEMTs show a low off state drain leakage current of 0.26 μA/mm and a high on/off current ratio (Ion/Ioff) of 5.1 × 106. In addition, the desirable current collapse and breakdown characteristics are also obtained. This work convincingly demonstrates the great potential and practicalit...

Keywords: ingan channels; performance; ingan; ingan double; high performance; performance ingan

Journal Title: Applied Physics Letters
Year Published: 2018

Link to full text (if available)


Share on Social Media:                               Sign Up to like & get
recommendations!

Related content

More Information              News              Social Media              Video              Recommended



                Click one of the above tabs to view related content.