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Effect of thickness on metal to semiconductor transition in La doped BaSnO3 films deposited on high mismatch LSAT substrates

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1% La doped BaSnO3 thin films of different thicknesses, ranging from 15 to 300 nm, were obtained on single crystal Lanthanum Aluminate-Strontium Aluminate Tantalate [LSAT(001)] substrates via Pulsed Laser Deposition. The… Click to show full abstract

1% La doped BaSnO3 thin films of different thicknesses, ranging from 15 to 300 nm, were obtained on single crystal Lanthanum Aluminate-Strontium Aluminate Tantalate [LSAT(001)] substrates via Pulsed Laser Deposition. The films grow epitaxially on these substrates (cube-on-cube epitaxy) and are almost relaxed with a strain of ≈0.51% for 300 nm films. All films show n-type conducting behavior with their conductivity varying from 65.36 S cm−1 to 465.11 S cm−1 as the thickness of the film is increased. Low temperature carrier concentration measurements indicate that the films are degenerate semiconductors. Films with a thickness ≥30 nm exhibit metal to semiconductor transition (MST) at low temperatures. Temperature dependent resistivity analysis of the films shows evidence of electron-electron interaction rather than weak localization as the governing transport mechanism below MST. The transition temperature shifts toward lower values at higher thicknesses, strengthening the metallic transport in such films.1% La doped BaSnO3 thin films of different thicknesses, ranging from 15 to 300 nm, were obtained on single crystal Lanthanum Aluminate-Strontium Aluminate Tantalate [LSAT(001)] substrates via Pulsed Laser Deposition. The films grow epitaxially on these substrates (cube-on-cube epitaxy) and are almost relaxed with a strain of ≈0.51% for 300 nm films. All films show n-type conducting behavior with their conductivity varying from 65.36 S cm−1 to 465.11 S cm−1 as the thickness of the film is increased. Low temperature carrier concentration measurements indicate that the films are degenerate semiconductors. Films with a thickness ≥30 nm exhibit metal to semiconductor transition (MST) at low temperatures. Temperature dependent resistivity analysis of the films shows evidence of electron-electron interaction rather than weak localization as the governing transport mechanism below MST. The transition temperature shifts toward lower values at higher thicknesses, strengthening the metallic transport in such films.

Keywords: semiconductor transition; metal semiconductor; doped basno3; transition

Journal Title: Applied Physics Letters
Year Published: 2019

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