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Characteristics of unintentionally doped and lightly Si-doped GaN prepared via pulsed sputtering

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We have grown structurally high-quality GaN with a low residual shallow donor concentration ( Click to show full abstract

We have grown structurally high-quality GaN with a low residual shallow donor concentration (<5 × 1015 cm−3) through pulsed sputtering. Light Si doping to this film with a Si concentration of 2 × 1...

Keywords: pulsed sputtering; lightly doped; doped lightly; doped gan; unintentionally doped; characteristics unintentionally

Journal Title: AIP Advances
Year Published: 2019

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