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Robust ferroelectric polarization retention in harsh environments through engineered domain wall pinning

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Robust retention of ferroelectric polarization in harsh environments is a requirement for the application of ferroelectric materials in space, liquids, and various chemical conditions. Surface screening of the polarization can… Click to show full abstract

Robust retention of ferroelectric polarization in harsh environments is a requirement for the application of ferroelectric materials in space, liquids, and various chemical conditions. Surface screening of the polarization can significantly alter domain states and usually has a strong influence on domain stability in ferroelectrics, hindering applications that require defined and non-volatile polarization states. Here, we show that designer defects in BiFeO3 can be engineered to strongly pin domain walls, which even in harsh environments such as 100% humidity and elevated temperatures of 175 °C leads to a superior polarization retention of several years for domain sizes well below 100 nm.

Keywords: polarization; ferroelectric polarization; domain; polarization retention; harsh environments

Journal Title: Journal of Applied Physics
Year Published: 2021

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