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Interface and optical properties of Zn1−xMgxO films with Mg content of more than 70% grown on the (12̄10)-ZnO substrates

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Fabricating Zn1−xMgxO films with a high Mg content is key to their applications in deep-ultraviolet optoelectronic devices. In this work, we report the preparation of Zn1−xMgxO films on (1210)-ZnO substrates… Click to show full abstract

Fabricating Zn1−xMgxO films with a high Mg content is key to their applications in deep-ultraviolet optoelectronic devices. In this work, we report the preparation of Zn1−xMgxO films on (1210)-ZnO substrates by molecular beam epitaxy. The Zn1−xMgxO/(1210)-ZnO structure is revealed by x-ray diffraction and high-resolution transmission electron microscopy. Remarkably, no cubic MgO is observed for films with 74.6% Mg content; the film shows mainly the wurtzite structure with some intermediate phases at the interface. Photoluminescence spectra show that the film exhibits good optoelectronic properties with a bandgap of 4.6 eV. This work provides a new avenue for the fabrication of deep-ultraviolet Zn1−xMgxO films.

Keywords: zno substrates; xmgxo films; films content; zn1 xmgxo

Journal Title: AIP Advances
Year Published: 2021

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