LAUSR

In this work, the effect of in situ SiNx grown with different carrier gas on the structural and electrical properties of the SiNx/AlGaN/GaN MIS-HEMTs is studied. It was found that the growth rate of SiNx grown with N2 as carrier gas (N2-SiNx) is more sensitive to different growth conditions, while the growth rate of SiNx grown with H2 as carrier gas (H2-SiNx) is very stable due to the inhibiting effects of H2 carrier gas on the SiH4–NH3 forward reactions. More importantly, a continuous and smooth SiNx growth at the initial stage can be realized with H2 carrier gas due to its faster surface migration, leading to a decent surface morphology and sharp interface of H2-SiNx. As a result, the SiNx passivated device with H2 as carrier gas shows improved performance compared to that with N2 as carrier gas, featuring ultra-low interface-state density of 2.8 × 1010 cm−2 eV−1, improved on- and off-state current, reduced threshold voltage shift, and mitigated current collapse, especially after long-term electrical stress. These results not only elaborate on the growth mechanisms of in situ SiNx with different carrier gases but also highlight the advances of H2 as carrier gas for in situ SiNx growth, providing an effective strategy to tailor the passivation schemes for GaN-based devices.