LAUSR.org creates dashboard-style pages of related content for over 1.5 million academic articles. Sign Up to like articles & get recommendations!

Low-current transport through dopant atom-based quantum dots in a nanoscale silicon transistor

Quantum dot (QD) single-electron transistors, using phosphorous dopant atom QDs with radii as small as ∼1.2 nm, are electrically characterized down to the ∼100 fA level and over a wide temperature range,… Click to show full abstract

Quantum dot (QD) single-electron transistors, using phosphorous dopant atom QDs with radii as small as ∼1.2 nm, are electrically characterized down to the ∼100 fA level and over a wide temperature range, from room-temperature (RT = 300 K) to 8 K. The QDs are embedded within highly scaled ∼5 nm silicon nanochannels. Full “Coulomb diamond,” current staircase, single-electron characteristics have been measured at 8 K, with low-current levels (∼100 fA to 5 pA) and power (35 fW). Single-electron addition energies Ea ∼ 0.3 eV are among the highest reported for dopant atom transistors. Unlike lithographically defined QDs, the ultra-small size of the QDs implies that both charging and quantization energies are large, each ∼0.1 eV or greater, and the current cross-sectional area is very small, down to a 4.5 nm2 dopant atom-based channel. Transitions in conduction from RT to 10 K are characterized using Arrhenius plots. Current magnitudes reduce by ∼106, and activation energies match Ea, as the device condenses into dopant atom transport channels.

Keywords: dopant atom; transport; atom; low current; atom based

Journal Title: Applied Physics Letters
Year Published: 2025

Link to full text (if available)


Share on Social Media:                               Sign Up to like & get
recommendations!

Related content

More Information              News              Social Media              Video              Recommended



                Click one of the above tabs to view related content.