Significance Understanding the relation between crystal structure and electronic properties is crucial for designing new quantum materials with desired functionality. So far, controlling a chemical bond is less considered as… Click to show full abstract
Significance Understanding the relation between crystal structure and electronic properties is crucial for designing new quantum materials with desired functionality. So far, controlling a chemical bond is less considered as an effective way to manipulate the topological electrons. In this paper, we show that the V–Al bond acts as a shield for protecting the topological electrons in Dirac semimetal VAl3. The Dirac electrons remain intact in the V1−xTixAl3 solid solutions, even after a substantial part of V atoms have been replaced. A Lifshitz transition from Dirac semimetal to trivial metal occurs as long as the V–Al bond is completely broken. Our finding highlights a rational approach for designing new quantum materials via controlling their chemical bond. Topological electrons in semimetals are usually vulnerable to chemical doping and environment change, which restricts their potential application in future electronic devices. In this paper, we report that the type-II Dirac semimetal VAl3 hosts exceptional, robust topological electrons which can tolerate extreme change of chemical composition. The Dirac electrons remain intact, even after a substantial part of V atoms have been replaced in the V1−xTixAl3 solid solutions. This Dirac semimetal state ends at x=0.35, where a Lifshitz transition to p-type trivial metal occurs. The V–Al bond is completely broken in this transition as long as the bonding orbitals are fully depopulated by the holes donated from Ti substitution. In other words, the Dirac electrons in VAl3 are protected by the V–Al bond, whose molecular orbital is their bonding gravity center. Our understanding on the interrelations among electron count, chemical bond, and electronic properties in topological semimetals suggests a rational approach to search robust, chemical-bond-protected topological materials.
               
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