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Influence of the sputtering conditions on the microstructure and lattice constants of Sr0.5Ba0.5Nb2O6 heteroepitaxial thin films

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Abstract Barium-strontium niobate Sr0.5Ba0.5Nb2O6 thin films were fabricated on MgO(001) substrates by RF cathode deposition in an oxygen atmosphere at various values of the introduced RF power (from 70 W to… Click to show full abstract

Abstract Barium-strontium niobate Sr0.5Ba0.5Nb2O6 thin films were fabricated on MgO(001) substrates by RF cathode deposition in an oxygen atmosphere at various values of the introduced RF power (from 70 W to 140 W). According to X-ray diffraction data, it has been found that the films are epitaxial and do not include any impurities. It has been established that with increase in the introduced RF power magnitude, the morphology of the film surface becomes more complicated, increasing its inheterogeneity and relief, while the value of the unit cell strain along the polar direction decreases. The reasons for the revealed regularities are discussed.

Keywords: conditions microstructure; thin films; sputtering conditions; sr0 5ba0; 5ba0 5nb2o6; influence sputtering

Journal Title: Ferroelectrics
Year Published: 2021

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