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Inhibitive effect of 4-amino-N-benzylidene-benzamide Schiff base on mild steel corrosion in HCl solution

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Abstract A newly Schiff base, 4-amino-N-benzylidene-benzamide (4-BAB) protection ability was synthesised from a condensation reaction of 4-aminobenzamide (4-AB) and benzaldehyde (BA). Adsorption and corrosion inhibition effect of this compound on… Click to show full abstract

Abstract A newly Schiff base, 4-amino-N-benzylidene-benzamide (4-BAB) protection ability was synthesised from a condensation reaction of 4-aminobenzamide (4-AB) and benzaldehyde (BA). Adsorption and corrosion inhibition effect of this compound on mild steel (MS) in 1.0 M HCl solution were studied. The data obtained from measurments of this compound were compared with that of 4-AB and BA using many electrochemical, microscopic and hydrogen gas evolution techniques to clarify superiority of the Schiff base. Some thermodynamic parameters were calculated from experimental results and discussed. The value of ΔGads showed that adsorption of 4-BAB on MS from acidic solution obeys the Langmuir adsorption isotherm model. Surface SEM images of the MS specimens which were exposed to 1.0 M HCl solution in the absence and presence of the inhibitors showed that a homogeneous and protective inhibitor film forms on the metal surface, which hinder corrosive attack. It was concluded that synthesising the Schiff base improves protection ability with respect to related amine and aldehyde and the inhibitive action is in the order of 4-BAB > 4-AB > BA. Highlights 4-Amino-N-benzylidene-benzamide (4-BAB) is synthesized by condensation reaction between 4-aminobenzamide (4-AB) and benzaldehyde (BA) The inhibitor efficiencies calculated from all the applied methods are in agreement and are found to be in the order: 4-BAB >4-AB > BA The adsorption process of inhibitors on mild steel surface obeys the Langmuir adsorption isotherm

Keywords: mild steel; benzylidene benzamide; amino benzylidene; base; solution; schiff base

Journal Title: Journal of Adhesion Science and Technology
Year Published: 2019

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