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Photoelectric properties of F-doped ZnO thin films prepared by sol-combustion

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ABSTRACT In this study, fluorine-doped ZnO (FZO) transparent conductive film was prepared using sol-combustion method at a low temperature. The optimized synthesis conditions were evaluated based on the analysis of… Click to show full abstract

ABSTRACT In this study, fluorine-doped ZnO (FZO) transparent conductive film was prepared using sol-combustion method at a low temperature. The optimized synthesis conditions were evaluated based on the analysis of crystal structure, morphology, and photoelectric properties. The results of X-ray diffraction (XRD), scanning electron microscopy (SEM), UV–visible absorption spectroscopy (UV–vis), and Hall test (HALL) show that under the optimal ratio of precursor solution and optimal doping concentration (10%), the sol-combustion method can produce FZO transparent conductive film with a higher transmittance (80%), higher conductivity (36.9 Ω cm), and better crystalline quality and surface morphology at a relatively low temperature of 250°C. The FZO films produced using sol-combustion method have good application prospect.

Keywords: sol combustion; combustion; photoelectric properties; combustion method; doped zno

Journal Title: Surface Engineering
Year Published: 2019

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