LAUSR

In this work, strong photoluminescence (PL) from physical vapor deposited GeSn on Ge-buffered Si is harvested by pursuing high deposition temperature. High-quality Ge0.938Sn0.062 films are obtained through sputtering epitaxy at a record high temperature of 405 °C. The PL peak intensity of the sputtering-grown GeSn is enhanced by 21 times compared to that of GeSn with similar Sn content grown by molecular beam epitaxy at 150 °C. The PL intensity ratio between the sputtering-grown GeSn and Ge virtual substrate reaches a value of 18. Power-dependent and temperature-dependent PL characterizations demonstrate that band-to-band recombination dominates in the sputtering-grown GeSn film. The results indicate that high-temperature sputtering epitaxy, which has the merit of low cost and high-productivity potential, is promising for preparing high-quality GeSn films for optoelectronic applications.