e show experimentally that the ferroelectric HfZrO induces a bandgap of 0.18 eV in graphene monolayer. The experiments are performed on top-gate graphene/HfZrO transistors showing a very high transconductance of… Click to show full abstract
e show experimentally that the ferroelectric HfZrO induces a bandgap of 0.18 eV in graphene monolayer. The experiments are performed on top-gate graphene/HfZrO transistors showing a very high transconductance of 1 mS and very carrier mobilities of 7900 cm2/Vs. SiC and hexagonal boron nitride induce also a bandgap in graphene, but HfZrO is a CMOS compatible material which can be deposited on large Si wafers.
               
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