Here, we analyse the effect of structure parameters like well width (w), central barrier width (b), and alloy concentration (x) on multisubband electron mobility μ in a GaAs-AlxGa1-xAs based modulation… Click to show full abstract
Here, we analyse the effect of structure parameters like well width (w), central barrier width (b), and alloy concentration (x) on multisubband electron mobility μ in a GaAs-AlxGa1-xAs based modulation doped asymmetric V-shaped-double-quantum-well (VDQW) structure. The asymmetry in the structure potential is generated through the difference in the doping concentrations (N d ) in the side barriers i.e., N d1 (0 to 4 × 1018 cm−3) and N d2 (2 × 1018 cm−3). The mobility μ is calculated by considering ionised impurity (imp) and alloy disorder (ad) scattering mechanisms. The continuous variation of x inside the well makes μ ad < μ imp resulting in the dominance of ad-scattering on μ as a function of N d1. As a result, at the interface an increase in x from 0.1 to 0.3 reduces μ around 40%. However, an increase in w symmetrically (w 1 = w 2) enhances μ. Further, the introduction of non-symmetric well profile (w 1 ≠ w 2) not only causes asymmetric redistribution of subband wave functions ψ 0 and ψ 1 in the wells, but also changes the position and hence occupation of subband energy levels, thereby influencing the subband mobility. As the difference in w 1 and w 2 increases, the system becomes more and more single subband occupied as a function of N d1 and hence the mobility enhances due to the absence of intersubband scattering. Our results also reflected that an increase in b from 20 Å to 80 Å has a marginal effect on μ during single subband occupancy but improves μ during double subband occupancy through intersubband interaction.
               
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